Characterization of Surface Oxidation on Rare-earth Er Film X-Ray Laser Target

摘要

Oxide growth on rate-earth erbium film at room temperature was quantitatively followed by means of quartz oscillation technique. Structure and chemistry of the oxide layer were characterized by X-ray diffraction and X-ray photoelectron spectroscopy. The humidity in oxidizing environment is found to be the key factor leading to the increase of oxidation rate of the erbium film. The oxide layer is composed of crystallites of erbium and erbium oxide. The O ls photoelectron spectra are characterized by two components that are assigned to oxide and hydroxide species respectively. The oxide layer shows a layered structure with an oxide layer covered by a hydroxide overlayer.