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Improvement of laser-induced damage threshold in CZ-BBO by reducing the light scattering center with annealing

机译:通过退火降低光散射中心来提高CZ-BBO中激光诱导的损伤阈值

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The laser-induced damage threshold in β -BaB_2O_4 grown by Czochralski method ( CZ-BBO ) is improved by annealing at 920°C to reduce the intensity of scattered light in the crystal. Experiments indicate that the reduction is generated as a result of dipole radiation vibrated along the z-axis. The threshold in 266 nm of annealed CZ-BBO is improved to 3.4 GW/cm~2, which is 1.70 times higher than that of as-grown CZ-BBO and 1.13 times higher than that of as-grown Flux-BBO.
机译:通过Czochralski方法(CZ-BBO)生长的β-BaB_2O_4的激光诱导损伤阈值可通过在920°C退火以降低晶体中散射光的强度来提高。实验表明,减少是由于沿z轴振动的偶极子辐射产生的。退火后的CZ-BBO在266 nm处的阈值提高到3.4 GW / cm〜2,比生长的CZ-BBO高1.70倍,比生长的Flux-BBO高1.13倍。

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