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Study of Hole Traps In P-type ZnSe and Znsse Epilayers by DLTS and Admittance spectroscopy

机译:DLTS和导纳光谱研究P型ZnSe和Znsse外延层中的空穴陷阱

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We Studied nitrogen doped ZnSe and ZnSse epilayers grown on p-GaAs substrates by MBE suing deep-level transient spectroscopy and admittance spectroscopy. Three major hole traps T1-T3 were observed with energy levels at 0.11, 0.46, and 0.56eV fro mthe valence band. Similar energy levels were observed in ZnSse:N except that T1 was at 0.12eV from the valence band. We attribute T1 to a nitrogne acceptor whihc ocntrols the p-type conduction in the materials. A crude estimation of the 0.11 eV trap concentration obtained from the data shows correlation with the free carrier concentration due to nitrogen. The two remaining levels may originate from the nitrogen doping process.
机译:我们通过深层瞬态光谱和导纳光谱研究了通过MBE在p-GaAs衬底上生长的氮掺杂ZnSe和ZnSse外延层。在价带上观察到三个主要的空穴陷阱T1-T3,其能级分别为0.11、0.46和0.56eV。在ZnSse:N中观察到相似的能级,除了T1距离价带为0.12eV。我们将T1归因于氮杂接受体,从而控制了材料中的p型传导。从数据获得的0.11 eV陷阱浓度的粗略估计显示出与氮引起的自由载流子浓度的相关性。剩余的两个水平可能源自氮掺杂过程。

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