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Analysis of unsteady heat and mass transfer during the modified chemical vapor deposition process

机译:分析改进的化学气相沉积过程中的不稳定传热和传质

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An analysis of unsteady heat and mass transfer in the Modified CHemical Vapor Deposition has been carried out. It is found that commonly used quasi-steady state assumption could be used to predict overall efficiency of particle deposition, however, the assumption would not be valid near the inlet region where tapered deposition occurs. The present unsteady claculations have been found to be capable of predicting detailed deposition pofile correctly even from the inlet region where further optimization is needed at the real practice. The present results have also been compared with the existing experimental data and were in good agreement. It is noted that previous quasi-steady calculation resulted in a significant difference in deposition profile near the inlet region. The effects of time varying torch speeds were also studied. Linearly varying torch speed case until time chemical bounds 120s resulted in a much shorter tapered entry than the constant torch speed case.
机译:已经对改性化学气相沉积中的不稳定传热和传质进行了分析。发现可以使用通常使用的准稳态假设来预测颗粒沉积的总体效率,但是,该假设在发生锥形沉积的入口区域附近无效。已经发现,即使从实际操作中需要进一步优化的入口区域来看,目前的不稳定描述也能够正确地预测详细的沉积物谱。目前的结果也已经与现有的实验数据进行了比较,并且吻合得很好。注意,先前的准稳态计算导致入口区域附近的沉积轮廓存在显着差异。还研究了随时间变化的割炬速度的影响。线性变化的割炬速度情况,直到时间达到化学极限120s为止,与恒定的割炬速度情况相比,锥形进入的时间要短得多。

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