X-Ray Diffraction as a Nondestructive Tool for Characterization of Thin Films, Nanocrystalline and Refractory Materials

摘要

X-Ray diffractio nhas been used as a tool to characterize Bi_2S_3, PbS, CdS and their alloy films. Nickel silicide films grown on silicon substrate have also been characterized for thier phase identification. It has been found that Ni_3Si_2 phase grows even at low temperature in presence of some impurities in the film.