It is well-known that mechanical treatment of silica glass during the manufacturing of acoustic resonators leads to the formation of the surface defect layer and it decreases Q-factor of the resonators. In the present study the properties and structure of surface defect layers of model cylindrical silica glass resonators were investigated. Chemical treatment of quartz resonators by etching and washing with solutions of different compositions allows to remove layer-by-layer the material of the surface layer distructed during mechanical treatment.To increase significantly Q-factor of silica glass resonator, the method of the surface defect layer removing was developed.
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