Investigating the relationship between material properties and laser induced damage threshold of dielectric optical coatings at 1064 nm

摘要

The Laser Induced Damage Threshold (LIDT) and material properties of various multi-layer amorphous dielectric optical coatings, including Nb_2O_5, Ta_2O_5, SiO_2, TiO_2, ZrO_2, AlN, SiN, LiF and ZnSe, have been studied. The coatings were produced by ion assisted electron beam and thermal evaporation; and RF and DC magnetron sputtering at Helia Photonics Ltd, Livingston, UK. The coatings were characterized by optical absorption measurements at 1064 nm by Photothermal Common-path Interferometry (PCI). Surface roughness and damage pits were analyzed using atomic force microscopy. LIDT measurements were carried out at 1064 nm, with a pulse duration of 9.6 ns and repetition rate of 100 Hz, in both 1000-on-1 and 1-on-1 regimes. The relationship between optical absorption, LIDT and post-deposition heat-treatment is discussed, along with analysis of the surface morphology of the LIDT damage sites showing both coating and substrate failure.