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Surface and bulk effects in silica fibers caused by 405 nm CW diode laser irradiation and means for mitigation

机译:二氧化硅纤维的表面和散装效应由405nm CW二极管激光照射和减轻装置

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Surface and bulk effects in silica optics due to high intensity laser light are well known using short pulse and high power laser systems. Surfaces are quickly destroyed mechanically if not properly prepared and thoroughly cleaned. Linear and non-linear absorption of high intensity laser light in the bulk of the optics causes material modifications, like voids, cracks and UV defects. In ablation experiments with very short pulses on wide band-gap dielectrics, periodic surface structures in the form of ripples were found. Surprisingly, we found similar structures on fiber end-faces after long-term irradiation with 405 nm CW laser light. Power densities on the end-face are in the range of 1 MW/cm~2, three magnitudes of order below the power threshold at which the described damages occur. Nevertheless a ripple structure perpendicular to the polarization direction of the laser was formed and grows with irradiation time. An increased absorption band at 214 nm (E' center) along the fiber was discovered by spectral absorption measurements. E' centers can be generated by 405 nm laser light in the bulk, therefore defects on the surface are possible as well. The generation of defect centers on the silica surface can enhance the formation of an unstable surface layer.
机译:由于高强度激光引起的硅胶中的表面和散装效应是使用短脉冲和高功率激光系统熟知的。如果没有正确准备和彻底清洁,表面会迅速地破坏表面。在光学大量光学中的高强度激光的线性和非线性吸收导致材料修饰,如空隙,裂缝和UV缺陷。在宽带间隙电介质上具有非常短的脉冲的消融实验中,发现了涟漪形式的周期性表面结构。令人惊讶的是,我们在长期照射后用405nm CW激光射击后发现了类似的结构。端面上的功率密度在1mW / cm〜2的范围内,下方的三个顺序阈值下方发生了所描述的损坏。然而,形成垂直于激光的偏振方向的纹波结构并用照射时间生长。通过光谱吸收测量发现沿纤维的214nm(E'中心)的增加的吸收带。 E'中心可以在体积中由405nm激光产生,因此表面的缺陷也是可能的。二氧化硅表面上的缺陷中心的产生可以增强形成不稳定的表面层的形成。

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