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Measurement of fluorescence spectra and quantum yields of 193 nm ArF laser photoablation of the cornea and synthetic lenticules

机译:角膜和合成微透镜的193 nm ArF激光光烧蚀的荧光光谱和量子产率的测量

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Abstract: Photorefractive keratomileusis procedures are currently being evaluated for both direct ablation of the human cornea and for the shaping of synthetic lenticules, with the ArF excimer laser offering the promise of reduced photochemical damage of underlying tissues due to the non-penetrative nature of 193 nm radiation. In order to better consider the possible effects of any secondary luminescence produced by the interaction of 193 nm radiation with these materials, an optical system based on a gated diode array spectrometer was constructed and used to record their fluorescence spectra at known laser fluences. A broadband fluorescence peak centered around 290-330 nm was observed upon irradiation of corneal buttons and collagen-based biopolymers. The optical efficiency of the fluorescence cell was calibrated by the use of a scattering material of known reflectivity allowing estimates of the fluorescence quantum yield of this process to be made.!26
机译:摘要:目前正在评估屈光性角膜磨镶术对人类角膜的直接消融和合成微透镜的成形的影响,由于193 nm的非穿透性,ArF受激准分子激光有望减少基础组织的光化学损伤。辐射。为了更好地考虑193 nm辐射与这些材料相互作用产生的任何二次发光的可能影响,构建了基于门控二极管阵列光谱仪的光学系统,并使用该光学系统记录了已知激光通量下的荧光光谱。在照射角膜钮扣和基于胶原的生物聚合物时观察到以290-330nm为中心的宽带荧光峰。通过使用具有已知反射率的散射材料来校准荧光盒的光学效率,从而可以估算该过程的荧光量子产率。26

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