首页> 外文会议> >Impurity profile determination by the optimal parameter choice method
【24h】

Impurity profile determination by the optimal parameter choice method

机译:通过最佳参数选择方法确定杂质分布

获取原文
获取原文并翻译 | 示例

摘要

Abstract: Model of the influence of the shallow and deep impurity level profiles on the capacitance relaxation curves was made using the optimal parameter choice method. There were established that the shallow impurity profile decay and the deep impurity profile growth increase the dimensionless time. Besides it the shallow impurity profile growth and the deep impurity profile decay decrease. Such effects give rise the undervalue of the dimensionless capacitance approximately ega for the first case and overvalue approximately ega for the second one. The received expressions for increment d may be used for the quantitative estimation of the shallow and deep impurity profiles without procedure of the differentiation of the experimental C-t-curves. That permit to increase the accuracy of the impurity profile determination. !4
机译:摘要:采用最佳参数选择方法,建立了浅,深杂质水平曲线对电容弛豫曲线影响的模型。已经确定,浅的杂质分布衰减并且深的杂质分布生长增加了无量纲的时间。除此之外,浅杂质轮廓的增长和深杂质轮廓的衰减都减小了。对于第一种情况,这样的影响会导致无量纲电容的低值大约ega,而对于第二种情况则会导致高值大约ega。所接收的增量为d的表达式可以用于浅和深杂质剖面的定量估计,而无需区分实验C-t曲线。这允许提高杂质分布确定的准确性。 !4

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号