首页> 外文会议> >Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system

【24h】

Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system

机译：电子回旋共振等离子体刻蚀系统中具有圆形轮廓的圆形波导过渡设计

获取原文

页面导航

著录项
相似文献
相关主题

著录项

来源
《》|2001年|P.550-553|共4页
会议地点
作者
Jan-Dong Tseng; Chi-Chan Lin; Fu Tai;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类无线电电子学、电信技术 ;
关键词

相似文献

外文文献
中文文献
专利

1. Inductively coupled plasma and electron cyclotron resonance plasma etching of an InGaAlP compound semiconductor system [Review] [J] . Hong J., Abernathy CR., Pearton SJ., Critical Reviews in Solid State and Materials Sciences . 1998 ,第4期

机译：InGaAlP化合物半导体系统的电感耦合等离子体和电子回旋共振等离子体刻蚀[综述]
2. Production of electron cyclotron resonance plasma by using multifrequencies microwaves and active beam profile control on a large bore electron cyclotron resonance ion source with permanent magnets a [J] . Yushi Kato Takeyoshi Watanabe Yuuki Matsui Yoshiaki Hirai Osamu Kutsumi Naoki Sakamoto Fuminobu Sato and Toshiyuki Iida Review of Scientific Instruments . 2010 ,第2期

机译：a 在具有大磁体的大口径电子回旋共振离子源上利用多频微波和有源束轮廓控制产生电子回旋共振等离子体
3. Design of electron cyclotron resonance based reactive ion etching system [J] . S K Angra, Parshant Kumar, R P Bajpai Indian journal of engineering and materials sciences . 2001 ,第4期

机译：基于电子回旋共振的反应离子刻蚀系统设计
4. Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system [C] . Jan-Dong Tseng, Chi-Chan Lin, Fu Tai Asia-Pacific Microwave Conference . 2001

机译：电子回旋谐振等离子体蚀刻系统中圆形轮廓的圆形波导过渡的设计
5. Comparison of high-density electron cyclotron resonance and inductively coupled plasma sources for etching of electronic materials: New plasma etch regimes for electronic materials. [D] . Lee, Jewon. 1997

机译：用于电子材料蚀刻的高密度电子回旋共振和感应耦合等离子体源的比较：电子材料的新等离子体蚀刻方案。
6. Linearly Tunable Fano Resonance Modes in a Plasmonic Nanostructure with a Waveguide Loaded with Two Rectangular Cavities Coupled by a Circular Cavity [O] . Qiong Wang, Zhengbiao Ouyang, Yiling Sun, 2019

机译：等离子体纳米结构中线性可调谐的Fano共振模式其波导装有两个矩形腔和一个圆形腔波导
7. Inductively Coupled Plasma and Electron Cyclotron Resonance Plasma Etching of an InGaAlP Compound Semiconductor System [O] . J. Hong, E. S. Lambers, C. R. Abernathy, 1998

机译：IngaALP化合物半导体系统的电感耦合等离子体和电子回旋谐振等离子体蚀刻
8. Circular Waveguide Systems for Electron-Cyclotron-Resonant Heating of the Tandem Mirror Experiment-Upgrade [R] . Felker, B., Calderon, M. O., Chargin, A. K., 1983

机译：圆形波导系统用于电子回旋共振加热串联镜实验升级

Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system

著录项

相似文献

相关主题

期刊订阅