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Surface Modification of Polyimide Films by DBD Atmospheric Pressure Plasma for Copper Metallization

机译:DBD大气压等离子体对铜金属化聚酰亚胺薄膜的表面改性

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Summary form only given. It is important to improve the adhesive strength between polyimide film and metal in microelectronics packaging. Surface modification of polyimide film by DBD atmospheric pressure plasmas are carried out to enhance the adhesion of the polymer with sputtered copper. In this study, N2 atmospheric pressure plasmas are generated and their influence on surface modification has been investigated. N2 meta-stable species such as N2 (A3Sigmau +) play a very important role in the surface treatment of polymer because of their high-energy contents. The N2 meta-stable densities with various discharge conditions are estimated by 1-D discharge simulation with spectroscopic measurements, and they are correlated with the change of adhesion strength. In addition, atmospheric plasmas with other gases such as O2, air, He and Ar are used for the surface modification of polyimide and compared with N2 plasmas. Improved adhesion between polyimide and sputtered copper can be explained by chemical and mechanical changes of polyimide surface imposed by plasma particles. These surface analyses are performed by XPS and AFM
机译:仅提供摘要表格。重要的是提高微电子包装中聚酰亚胺膜与金属之间的粘合强度。通过DBD大气压等离子体对聚酰亚胺薄膜进行表面改性,以增强聚合物与溅射铜的粘附力。在本研究中,产生了N 2 个大气压等离子体,并研究了它们对表面改性的影响。 N 2 个亚稳态物种,例如N 2 (A 3 Sigma u + )由于其高能量含量,在聚合物的表面处理中起着非常重要的作用。用光谱测量法通过一维放电模拟估算出各种放电条件下的N 2 亚稳态密度,并将它们与粘附强度的变化相关联。此外,将大气等离子体与O 2 ,空气,He和Ar等其他气体用于聚酰亚胺的表面改性,并与N 2 等离子体进行了比较。聚酰亚胺和溅射铜之间的附着力提高可以通过等离子体粒子对聚酰亚胺表面进行化学和机械改变来解释。这些表面分析是由XPS和AFM执行的

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