3D simulation system for moving mask deep X-ray lithography

摘要

This paper presents a new 3-dimensional (3D) simulation system for moving mask deep X-ray lithography (M/sup 2/DXL) technique. The newly developed X-ray lithography simulation system named X-ray lithography simulation system for 3-dimensional fabrication (X3D) is tailored to simulate the fabrication process of 3D microstructures using the M/sup 2/DXL technique. We have adopted the fast marching method for the development module, and confirmed that X3D correctly predicts the 3D dissolution process of exposed PMMA. A general overview on the X3D, the new approach with the fast marching method to predict 3D microstructures, and the verification of the simulation result are presented.