Recently, the authors developed a cathodic arc evaporation source with a heated boron cathode and successfully applied it to the deposition of cubic BN thin films. The cathode surface area under operation exhibits an extended red-hot area and therefore the so-called distributed arc mode was suspected first. Nevertheless, high-speed photography has revealed that cathode spots exist which move randomly in a similar manner as cathode spots on metal. The discharge mode of the hot boron cathode has been characterized both in Ar and a N/sub 2//Ar atmosphere. The properties of the ion component of the emitted plasma were investigated by energy-resolved mass spectroscopy and conclusions are drawn on the potentials of the boron are evaporation as a deposition process for c-BN films.
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机译：最近，作者开发了带有加热的硼阴极的阴极电弧蒸发源，并将其成功地应用于立方BN薄膜的沉积。在操作中的阴极表面积显示出扩大的炽热区域，因此首先怀疑所谓的分布电弧模式。然而，高速摄影已经揭示出存在阴极斑点，其以与金属上的阴极斑点相似的方式随机移动。热硼阴极的放电模式已在Ar和N / sub 2 // Ar气氛中进行了表征。通过能量分辨质谱法研究了所发射等离子体的离子成分的特性，并得出了硼在作为c-BN薄膜沉积过程中的蒸发势的结论。
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