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Einstein relation and transport equations in heavily doped silicon

机译:重掺杂硅中的爱因斯坦关系和输运方程

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This paper proposes two forms of generalized Einstein relation that embed all heavy doping effects in such a way that corresponding transport equations retain their form as in lightly doped silicon. In the first corresponding form of the transport equations all heavy doping effects are added to their diffusion components through so-called effective diffusion coefficients. The second form of the transport equations is based on the effective carrier concentrations and is suitable for application in device simulation programs. Concrete dependencies of relevant physical parameters are given for silicon, heavily doped by phosphorous, while the whole theory is generally applicable for all semiconductors whose bandgap behaviour in terms of its dependence on doping is known.
机译:本文提出了两种形式的广义爱因斯坦关系,它们嵌入了所有重掺杂效应,从而使相应的输运方程式保持了其在轻掺杂硅中的形式。在传输方程的第一种对应形式中,所有重掺杂效应都通过所谓的有效扩散系数添加到其扩散成分中。传输方程式的第二种形式基于有效载流子浓度,适用于设备仿真程序。给出了由磷重掺杂的硅的相关物理参数的具体依赖性,而整个理论通常适用于已知带隙行为与掺杂有关的所有半导体。

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