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Passivation and reactivation of deep Fe and Cu levels in p-type GaAs

机译:p型GaAs中深铁和铜水平的钝化和再活化

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Epitaxial p-type GaAs layers were exposed to a hydrogen plasma. Some of the passivated samples were then annealed under reverse bias in order to determine the energy for thermal dissociation of the passivated deep level-hydrogen complex. In particular, the deep levels attributed to iron and copper were examined. Deep Level Transient Spectroscopy (DLTS) has been used to determine the extent of passivation and reactivation of these deep levels. Although passivation of the copper levels has previously been reported, this is the first time that passivation of the iron level has been observed. A dissociation energy of 0.83 eV was determined for the Fe-H complex.
机译:将外延p型GaAs层暴露于氢等离子体。然后将一些钝化样品在反向偏压下退火,以确定钝化深能级-氢络合物的热解离能量。特别地,检查了归因于铁和铜的深层。深层瞬态光谱法(DLTS)已用于确定这些深层的钝化和再活化程度。尽管先前已经报道了铜水平的钝化,但这是第一次观察到铁水平的钝化。 Fe-H络合物的离解能为0.83 eV。

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