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Characterization of Diamond-Like Carbon Films Prepared by Plasma Enhanced Chemical Vapor Deposition with Vertical-capacitor Electrodes

机译：垂直电容器电极通过等离子增强化学气相沉积制备的类金刚石碳膜的表征

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《》|2001年|P.470-474|共5页
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Kwang Bae Lee; Byung Roh Rhee;
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中图分类无线电电子学、电信技术;
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3. Characterization of diamond-like carbon thin films prepared by a microwave plasma enhanced chemical vapor deposition method [J] . Choi WS, Chung I, Lee YZ, Surface & Coatings Technology . 2004,第0期

机译：微波等离子体增强化学气相沉积法制备类金刚石碳薄膜的表征
4. X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma [J] . F. Salah, B. Harzallah, A. van der Lee, Thin Solid Films . 2013,第juna30期

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5. Effects of source gases on the properties of siliconitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition [J] . Nakazawa Hideki, Magara Kohei, Takami Takahiro, Thin Solid Films . 2017,第auga31期

机译：原料气对等离子体增强化学气相沉积法制备的硅/氮结合类金刚石碳膜性能的影响
6. Characterization of Diamond-Like Carbon Films Prepared by Plasma Enhanced Chemical Vapor Deposition with Vertical-capacitor Electrodes [C] . Kwang Bae Lee, Byung Roh Rhee, Institute of Electric and Electronic Engineer International Vacuum Microelectronics Conference . 2001

机译：用垂直电容电极等离子体增强化学气相沉积制备的金刚石状碳膜的表征
7. Thermal degradation and tribological behavior of diamond-like carbon films prepared by plasma-assisted chemical vapor deposition. [D] . Kim, Daesig. 1991

机译：通过等离子体辅助化学气相沉积制备的类金刚石碳膜的热降解和摩擦学行为。
8. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
9. Plasma Enhanced Chemical Vapor Deposition and Electrical Characterization of Diamond-Like Carbon Thin Films [O] . Md. Kamrul Hassan 2007

机译：类金刚石碳薄膜的等离子体增强化学气相沉积和电学表征

Characterization of Diamond-Like Carbon Films Prepared by Plasma Enhanced Chemical Vapor Deposition with Vertical-capacitor Electrodes

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