Fabrication of domain-inverted gratings in MgO:LiNbO/sub 3/ by applying voltage under ultraviolet irradiation through photomask at room temperature

摘要

A new and simple fabrication method of domain-inverted gratings in MgO:LiNbO/sub 3/ is demonstrated. It was found that ultraviolet (UV) light irradiation reduces the voltage for inversion. Domain-inverted gratings of /spl sim/15 /spl mu/m period were fabricated by voltage application at room temperature under irradiation of UV light periodically-patterned using a photomask.