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Fabrication and characterization of spinel magnetic nanoparticle thin film transmission lines

机译:尖晶石磁性纳米粒子薄膜传输线的制备与表征

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Spinel magnetic nanoparticle thin films were fabricated on high resistivity silicon substrates. TRL (through-reflect-line) calibration standards for CPW lines were fabricated on samples of high resistivity silicon with and without the magnetic thin film. Measurements show an increase of approximately 0.3 in the effective combined dielectric/magnetic constant for a film thickness of 100 nm. Capacitors are fabricated to determine the relative permittivity of the thin film. The relative permeability is determined using comparisons of the measured effective dielectric/magnetic constant with simulated data.
机译:在高电阻率的硅基板上制备尖晶石磁性纳米颗粒薄膜。 CPW线的TRL(直通线)校准标准品是在带有或不带有磁性薄膜的高电阻率硅样品上制造的。测量表明,对于100 nm的膜厚度,有效的组合介电/磁常数增加了约0.3。制造电容器以确定薄膜的相对介电常数。相对磁导率是通过将测得的有效介电/磁常数与模拟数据进行比较来确定的。

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