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Electrical characteristics and lifetimes of microdischarge devices having thin dielectric films of aluminum oxide,boron nitride, or barium titanate

机译:具有氧化铝,氮化硼或钛酸钡介电薄膜的微放电装置的电特性和寿命

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The electrical (V-I) characteristics, radiative efficiencies, and lifetimes of Ni screen/dielectric/Ni microdischarge devices, having overall thicknesses as small as >100 /spl mu/m and cylindrical microchannels 50-150 /spl mu/m in diameter, are investigated for Al/sub 2/O/sub 3/, BN, and BaTiO/sub 3/ dielectric films that are 120 or 200 /spl mu/m, 30 /spl mu/m, and 5 /spl mu/m in thickness, respectively. Having dielectrics fabricated by sol-gel processes or colloidal deposition and operated with Ne gas pressures between 300 and 1200 Torr (300K), these devices operate at voltages as low as /spl sim/93 V (100 /spl mu/m dia. BaTiO/sub 3/ device), and exhibit exceptional stability and lifetimes. After 100 h of continuous operation, a Ni screen/30 /spl mu/m BN/Ni device operating in 700 Torr Ne (static gas fill) at 100 V produces /spl sim/98% of its initial radiant output.
机译:Ni屏蔽/电介质/ Ni微放电装置的电(VI)特性,辐射效率和寿命为总厚度小至> 100 / spl mu / m且直径为50-150 / spl mu / m的圆柱形微通道研究了厚度为120或200 / spl mu / m,30 / spl mu / m和5 / spl mu / m的Al / sub 2 / O / sub 3 /,BN和BaTiO / sub 3 /介电膜, 分别。这些器件具有通过溶胶-凝胶法或胶体沉积法制造的电介质,并在300至1200托(300K)的Ne气压下运行,可在低至/ spl sim / 93 V(100 Ba / spl mu / m直径的BaTiO)的电压下运行/ sub 3 /设备),并具有出色的稳定性和使用寿命。连续运行100小时后,在100伏特的700 Torr Ne(静态气体填充)下运行的Ni筛网/ 30 / spl mu / m BN / Ni设备可产生/ spl sim / 98%的初始辐射输出。

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