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A 0.5 /spl mu/m 3 V 1T1C 1 Mb FRAM with a variable reference bitline voltage scheme using a fatigue-free reference capacitor

机译:0.5 / spl mu / m 3 V 1T1C 1 Mb FRAM,采用无疲劳参考电容器,具有可变参考位线电压方案

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Ferroelectric random access memory (FRAM/sup (R)/) has been intensively studied because of its high potential for low-power, high-speed operation and high switching endurance. The 2-transistor 2-capacitor (2T2C) cell structure offers stable read, however, it is not suitable for a high-density memory because of the larger cell area. The 1-transistor 1-capacitor (1T1C) cell structure is expected to be the key technology for realizing a megabit FRAM.
机译:由于铁电随机存取存储器(FRAM / sup(R)/)具有低功耗,高速运行和高开关耐久性的巨大潜力,因此对其进行了深入的研究。 2晶体管2电容器(2T2C)单元结构提供稳定的读取,但是,由于单元面积较大,因此不适合用于高密度存储器。 1晶体管1电容器(1T1C)单元结构有望成为实现兆位FRAM的关键技术。

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