Deep UV mastering using an all-solid-state 266 nm laser for an over 14 Gb/in/sup 2/

摘要

The deep UV mastering process of the next generation high-density disk is demonstrated using an all-solid-state CW 266 nm laser for the first time. We achieved a density of over 14 Gbit/in/sup 2/ with acceptable jitter using both novolak type resist and chemically amplified resist.