Summary form only given. Plasma Source Ion implantation technology is being widespread over applications and countries. Last year the R&D of PSII had been started in KERI. We have developed a small scale setup (18 liters in volume plasma chamber). Magnetically confined plasma is produced by a DC hot cathode discharge. Four high emission impregnated cathodes provide stable, quite uniform plasma in 10/sup -5/-10/sup -3/ torr pressure range. The plasma density is up to 10/sup 11/ cm/sup -3/ can be obtained for discharge current about 10 A. The target to be treated is negatively pulse repetitive biased by 30 kV vacuum tube modulator controlled by IGBT-based controller. The modulator provides square pulse with 0.5 /spl mu/sec rising time that can be varied if necessary. The present study concerns to the investigation of spatial and temporal plasma and sheath parameters in argon and nitrogen discharges. Langmuir probe diagnostic is used for plasma sheath parameters measurement. It was found that for high plasma density, the sheath completely stop in a few microseconds and a presheath is formed. Computer simulations of plasma and sheath behavior have been done using XPDC1 bounded electrostatic code.
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