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An electrostatic sweep plate device for emittance measurement of ion beams to 2 MeV

机译:一种用于测量离子束至2 MeV的发射率的静电扫盘装置

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Electrostatic sweep plate devices have been used previously for the measurement of ion beam emittance. These devices may be routinely designed with an ultimate angle resolution of /spl plusmn/0.25 mrad or less. We have used a similar device for measuring the emittance of H/sup -/ and H/sup +/ beams exiting an RFQ at 1 MeV. This scanner will be used to characterize the beam exiting a low-power DTL at energies up to 2 MeV. The physics design changes consist primarily of increasing the length of the deflection plates and decreasing their separation to obtain high electric field at low deflection plate voltage. The front face of the scanner was made thicker and designed for water cooling to withstand the beam power at up to 2 MeV. The design of the scanner is discussed. This includes the device angular resolution and maximum acceptable angle. The thermal analysis that led to the design of the water-cooled front face is shown. Data showing the performance of the device and resulting emittance measurements at 1 MeV are presented.
机译:静电扫盘装置先前已经用于测量离子束发射率。这些设备可以按常规设计,极限角度分辨率为/ spl plusmn / 0.25 mrad或更小。我们已经使用了类似的设备来测量以1 MeV离开RFQ的H / sup-/和H / sup + /光束的发射率。该扫描仪将用于表征以低至2 MeV的能量从低功率DTL射出的光束。物理设计的变化主要包括增加偏转板的长度并减小其间距,以在低偏转板电压下获得高电场。扫描仪的正面更厚,设计用于水冷以承受高达2 MeV的光束功率。讨论了扫描仪的设计。这包括设备的角度分辨率和最大可接受角度。显示了导致水冷式正面设计的热分析。呈现的数据显示了器件的性能以及在1 MeV下产生的发射率测量结果。

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