Abstract: An experimental and theoretical study of a coherent multiple imaging technique that utilizes a Fabry-Perot etalon placed between the photo mask and the projection lens is reported. This technique can enhance both resolution and depth of focus in optical microlithography. A lithography simulation tool, Prolith/2 was used to evaluate the aerial image profile using a complex phase-amplitude pupil-plane filter to simulate the effect of the Fabry-Perot etalon. This work specifically discusses the evaluation of extended periodic patterns, widely used in lithographic simulations. Simulation results are described and compared with experimental data. The impact of Talbot images generated by periodic structures is also described. !9
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