Realizing Metal and Quantum Dot Containing Patterns by Two- Photon Lithography

摘要

We summarize here studies aimed at incorporating silver nanoparticles or semiconductor nanoparticles (quantum dots) into polymeric microstructures. Two different approaches are followed in the case of silver nanoparticles and quantum dots (QDs). In case of silver a combination of photoreduction and thermal annealing are adapted. This combination is used to reduce a silver salt precursor to generate silver nanoparticles inside a photopolymerizable resin. Quantum dots were functionalized with photocrosslinkable ligands to enable their easy integration into a photopatternable resin.