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Surface roughness of Gallium Nitride with Volcano-like Protrusions Formed by KrF Excimer Laser Etching

机译:KrF受激准分子激光刻蚀形成的具有火山状凸起的氮化镓的表面粗糙度

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Use of deep ultraviolet (248 nm) KrF laser irradiation to roughen vertical GaN-based LEDs surface with volcano-like protrusions for light output (Lop) improvement was proposed and demonstrated. After pulse irradiations of KrF laser (750-850 mJ/cm~2), the rate of electron-hole pair recombination at sites with dislocation defects is greater than for crystalline GaN, favoring for the formation of GaO_x, and in turn, resulting in a relatively lower etching rate therein and leading to a roughened surface with volcano-like protrusions. Typical diameter/height and density of protrusions are around 2~4 μm/2 μm and 10~6 cm~(-2). Through the use of KrF laser and KOH etching, an enhancement in the root-mean-square surface roughness by 250 times and an improvement in Lop by 25% at 750 mA were obtained. It is expected that the surface roughness of Gallium Nitride by KrF excimer laser technology would be a potential candidate for the fabrication of high power GaN-based LEDs for solid-state lighting in the near future.
机译:提出并证明了使用深紫外(248 nm)KrF激光辐照来粗糙化具有火山状凸起的垂直GaN基LED表面,以改善光输出(Lop)。在用KrF激光(750-850 mJ / cm〜2)进行脉冲辐照后,具有位错缺陷的位置的电子-空穴对复合速率要比晶体GaN大,这有利于GaO_x的形成,进而导致其中相对较低的蚀刻速率并导致具有火山状突起的粗糙表面。典型的突起的直径/高度和密度约为2〜4μm/ 2μm,约为10〜6 cm〜(-2)。通过使用KrF激光和KOH蚀刻,在750 mA下获得了250倍的均方根表面粗糙度和25%的Lop改善。预计在不久的将来,通过KrF准分子激光技术氮化镓的表面粗糙度将成为用于固态照明的高功率GaN基LED制造的潜在候选者。

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