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Laser processes for repair of thin-film wiring

机译:修复薄膜布线的激光工艺

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Abstract: Lasers are being used for a wide range of applications in the microelectronics and packaging industries in such diverse applications as etching, film deposition, repair of open circuits and short circuits, machining and trimming of components, and heating of solder connections. In these applications, the laser radiation is primarily used as a heat source, to melt, ablate, or otherwise alter a material through a thermal process. The use of a laser under these conditions can often lead to damage to the surrounding layers or underlayers, which is particularly important when the laser is not well controlled and when the surrounding layers are thermally sensitive. The development of high-performance wiring for greater wiring density and smaller signal propagation delays has placed greater emphasis on the control of laser-initiated thermal processes. The thin film metal patterns produced in IBM's packaging programs can be used in a wide variety of metal/insulator structures. Although the metallurgies are typically copper based, the choice of insulator materials can vary, with structures produced with both inorganic (glasses and ceramics) and organic (polymers) dielectrics. Several laser-based technologies have been developed at IBM, establishing the capability to modify fine line circuit patterns on the range of packaging materials. These modification techniques, either to repair defects created during the manufacturing process or to restructure the circuit for design and performance reasons, can be achieved with the proper control of the laser conditions. This ability to control the laser/material interaction, with the goal of successfully modifying the circuit without adversely affecting the integrity of the dielectric will be discussed. The applications of these techniques to IBM's thin film packaging will be described, with specific focus on the two technologies recently introduced for the manufacture of East Fishkill's new high end packaging products.!7
机译:摘要:激光在微电子和包装行业中的应用广泛,例如蚀刻,薄膜沉积,开路和短路修复,零件的机械加工和修整以及焊料连接的加热等。在这些应用中,激光辐射主要用作热源,以通过热处理熔化,烧蚀或改变材料。在这些条件下使用激光通常会损坏周围的层或底层,这在激光控制不当且周围的层对热敏感时尤其重要。为了获得更大的布线密度和更小的信号传播延迟,高性能布线的发展更加强调了对激光引发的热过程的控制。 IBM的包装程序中产生的薄膜金属图案可用于多种金属/绝缘体结构中。尽管冶金通常是基于铜的,但绝缘材料的选择可能会有所不同,结构会同时使用无机(玻璃和陶瓷)和有机(聚合物)电介质。 IBM已开发了几种基于激光的技术,这些技术可以修改包装材料范围内的细线电路图案。这些修改技术,无论是修复在制造过程中产生的缺陷,还是由于设计和性能原因而使电路重构,都可以通过适当控制激光条件来实现。将讨论控制激光/材料相互作用的能力,其目的是成功修改电路而不会不利地影响电介质的完整性。将描述这些技术在IBM薄膜包装中的应用,特别关注最近为生产East Fishkill的新型高端包装产品而引入的两种技术。7

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