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High-Quality electron bunch production for high-brilliance Thomson Scattering sources

机译:高亮度Thomson散射源的高质量电子束生产

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Laser Wake Field accelerated electrons need to exhibit a good beam-quality to comply with requirements of FEL or high brilliance Thomson Scattering sources, or to be post-accelerated in a further LWFA stage towards TeV energy scale. Controlling electron injection, plasma density profile and laser pulse evolution are therefore crucial tasks for high-quality e-bunch production. A new bunch injection scheme, the Resonant Multi-Pulse Ionization Injection (RMPII), is based on a single, ultrashort Ti:Sa laser system. In the RMPII the main portion of the pulse is temporally shaped as a sequence of resonant sub-pulses, while a minor portion acts as an ionizing pulse. Simulations show that high-quality electron bunches with energies in the range 265MeV - 1.15GeV, normalized emittance as low as 0.08 mm-mrad and 0.65% energy spread can be obtained with a single 250 TW Ti:Sa laser system. Applications of the e-beam in high-brilliance Thomson Scattering source, including 1.5 - 26.4 MeV γ sources with peak brilliance up to 1 • 10~(28)ph/(s • mm~2 • mrad~2 • 0.1 % bw), are reported.
机译:激光唤醒场加速电子需要表现出良好的束质量,以符合FEL或高亮度Thomson散射源的要求,或者在进一步的LWFA阶段朝TeV能级进行后加速。因此,控制电子注入,等离子体密度分布和激光脉冲演变是高质量电子束生产的关键任务。一种新的束注入方案,共振多脉冲电离注入(RMPII),基于单个超短Ti:Sa激光系统。在RMPII中,脉冲的主要部分在时间上被塑造为一系列共振子脉冲,而次要部分则充当电离脉冲。仿真表明,使用单个250 TW Ti:Sa激光系统,可以获得能量在265MeV-1.15GeV,归一化发射率低至0.08 mm-mrad和0.65%能量散布的高质量电子束。电子束在高亮度汤姆森散射源中的应用,包括峰值亮度高达1•10〜(28)ph /(s•mm〜2•mrad〜2•0.1%bw)的1.5-26.4 MeVγ源,均已报告。

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