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Texture development of Ni_3Al thin foils during recrystallization and grain growth

机译:Ni_3Al薄箔在再结晶和晶粒生长过程中的织构发展

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The texture evolution of 83% cold-rolled Ni_3Al foils during recrystallization was examined through heat treatments at 600 C, 800 C, and 1000 C for 30 min. X-ray texture measurements revealed that the texture changed from the as-rolled Goss to a transitional complicated one by primary recrystallization and eventually returned to the Goss texture during grain growth. The SEM-EBSD analysis revealed that the return to the Goss texture was accompanied by the decrease of random boundaries (RBs) and the increase of Σ1 boundaries. The preferential growth of the Goss-oriented grains was explained by the difference in the grain boundary energy between the RBs and Σ1, based on the observed grain-orientation maps.
机译:通过在600 C,800 C和1000 C下热处理30分钟,检查了83%冷轧Ni_3Al箔在重结晶过程中的织构演变。 X射线纹理测量表明,由于初次重结晶,纹理从轧制的高斯转变为过渡的复杂晶粒,并最终在晶粒生长期间恢复为高斯纹理。 SEM-EBSD分析表明,返回高斯织构伴随着随机边界(RBs)的减少和Σ1边界的增加。基于观察到的晶粒取向图,RBs和Σ1之间的晶界能差异解释了高斯取向晶粒的优先生长。

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