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V-MCM-22: Synthesis and Characterization of a Novel Molecular Sieve

机译:V-MCM-22:新型分子筛的合成与表征

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This work presents the synthesis and spectroscopic characterization of V-MCM-22, a novel molecular sieve. The synthesis was performed under static hydrothermal crystallization, using VOSO_4 as source of vanadium at SiO_2/V_2O_3 = 66 and hexamethyleneimine as structure-directing agent. Aluminum was also incorporated in the structure at SiO_2/Al_2O_3 ratios (SAR) of 50 and 80, named V-MCM-22 (50) and V-MCM-22 (80) respectively. Only V-MCM-22 (50) showed higher crystallinity than the parent MCM-22. The insertion of vanadium ions in the framework sites was confirmed by diffuse reflectance (DR) UV-Vis and FT1R spectroscopy, the latter using CO adsorption at 100K. The V-MCM-22 (50) sample presented V in the 5+ state after calcination of the template; two families of vanadium sites were found: a family of distorted tetrahedral oxovanadium (SiO)_3V=O species absorbing at 290, 250 and 330 nm which underwent a reduction to V~(IV) (d-d transition at 550 nm) after treatment in H_2 at 500℃, and a family of tetrahedral oxovanadium with a lower distortion degree, which showed bands at 225, 245 and 265 nm. The latter species were stable after reduction. Hydroxyls bound either to the Lewis vanadium centers or to partially extra-framework Al ions were detected by FTIR and their acidity monitored by CO adsorption. The stretching frequency of these hydroxyls showed a red-shift of ca. 200 cm~(-1) by CO adsorption which suggests an acidity intermediate between silanols (90 cm~(-1)) and bridged SiO(H)Al groups (320 cm~(-1)). This material is a good candidate for selective oxidation reactions of organic molecules.
机译:这项工作介绍了新型分子筛V-MCM-22的合成和光谱表征。合成是在静态水热结晶下进行的,使用VOSO_4作为SiO_2 / V_2O_3 = 66的钒源和六亚甲基亚胺作为结构导向剂。还以50和80的SiO 2 / Al 2 O 3比率(SAR)将铝掺入结构中,分别命名为V-MCM-22(50)和V-MCM-22(80)。仅V-MCM-22(50)的结晶度高于母体MCM-22。钒离子在构架部位的插入通过漫反射(DR)紫外可见光谱和FT1R光谱确定,后者使用100K的CO吸附。在模板煅烧后,V-MCM-22(50)样品的V呈5+状态。发现了两个钒位点族:一族扭曲的四面体氧钒(SiO)_3V = O物种在290、250和330 nm处吸收,在H_2中处理后还原为V〜(IV)(在550 nm处出现dd跃迁)。在500℃下,一个畸变度较低的四面体氧钒家族,在225、245和265 nm处显示出能带。后一种在还原后是稳定的。通过FTIR检测结合到Lewis钒中心或部分构架外Al离子上的羟基,并通过CO吸附监测其酸度。这些羟基的拉伸频率显示出约红移。 200 cm〜(-1)的CO吸附表明硅醇(90 cm〜(-1))和桥连的SiO(H)Al基团(320 cm〜(-1))之间呈酸性。这种材料是有机分子选择性氧化反应的良好选择。

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