Controlled Growth of Carbon Nanotubes Using Pulsed Glow-Barrier Discharge

摘要

This paper describes aligned growth of carbon nanotubes using pulsed glow barrier discharge at atmospheric pressure. In the first section we present general aspect of nanotubes deposited with He-based atmospheric pressure glow discharge (APG) generated by a 130-kHz sine voltage. The effect of substrate preparation (Ni/quartz or Ni/Si) and feed gas (CH_4 or C_2H_2) on nanotube morphology is discussed. Then pulsed APG, which would create directional electric field near substrate, is discussed for the improvement of aligned growth. Marginally aligned nanotubes were observed with positive pulsed voltage, while nanotubes became thicker and shorter in the case of negative pulsed voltage. We also found that high temperature ( > 750 ℃) and high pulse duty ( > 25%) is essential for better alignment in pulsed APG. Finally, we present concluding remarks along with future work for further improvement of APG-assisted chemical vapor deposition.