首页> 外文会议>International Symposium on Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers; 20050627-0701; Paris(FR) >Formation of Al-Si Composite Oxide Films on Aluminum by Electrophoretic Sol-Gel Coating / Anodizing
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Formation of Al-Si Composite Oxide Films on Aluminum by Electrophoretic Sol-Gel Coating / Anodizing

机译:电泳Sol-Gel涂层/阳极氧化在铝上形成Al-Si复合氧化物膜

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Highly pure aluminum specimens (99.99 %) with electropolishing or DC-etching were covered with SiO_2 films by electrophoretic sol-gel coating, and were anodized in a neutral borate solution. Structure and dielectric properties of the anodic oxide films were examined by SEM, TEM, EDX, and electrochemical impedance spectroscopy. It was found that anodizing of both specimens after electrophoretic deposition lead to the formation of anodic oxide films consisting of an inner alumina layer and an outer Al-Si composite oxide layer. The anodic oxide films formed thus had slightly higher capacitances than anodic oxide films on aluminum without any coating. Higher heating temperatures after electrophoretic deposition caused the capacitance of anodic oxide films to increase.
机译:通过电泳溶胶-凝胶涂层用SiO_2薄膜覆盖经过电抛光或DC蚀刻的高纯铝样品(99.99%),并在中性硼酸盐溶液中进行阳极氧化。通过SEM,TEM,EDX和电化学阻抗谱检查了阳极氧化膜的结构和介电性能。发现在电泳沉积之后两个样品的阳极氧化导致形成由内部氧化铝层和外部Al-Si复合氧化物层组成的阳极氧化膜。因此形成的阳极氧化膜比没有任何涂层的铝上的阳极氧化膜具有稍高的电容。电泳沉积后较高的加热温度导致阳极氧化膜的电容增加。

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