首页> 外文会议>International Symposium on Magnetic Materials, Processes, and Devices Ⅵ: Applications to Storage and Microelectromechanical Systems (MEMS) Oct 23-26, 2000, Phoenix, Arizona >ORIGIN OF INCLUSION OF FOREIGN ELEMENTS DURING THE ELECTRODEPOSITION OF SOFT MAGNETIC NiFe, CoNiFe AND CoNiFeO ALLOYS: SIMS AND XPS ANALYSIS
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ORIGIN OF INCLUSION OF FOREIGN ELEMENTS DURING THE ELECTRODEPOSITION OF SOFT MAGNETIC NiFe, CoNiFe AND CoNiFeO ALLOYS: SIMS AND XPS ANALYSIS

机译:NiFe,CoNiFe和CoNiFeO合金电沉积过程中杂质元素的来源:SIM和XPS分析

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SIMS analysis of soft magnetic NiFe, CoNiFe, and CoNiFeO alloys was used to quantify the presence of the following foreign elements: O, H, C, N, S, Cl, and B. XPS analysis was used to obtain chemical state information. The amount of foreign elements in the alloys was found to be dependent on the concentration of electrolytes in the plating bath and organic additives present. Calculation of equilibrium species present in the CoNiFe plating bath in pH range 2-6 shows the presence of possible electroactive species as noncomplexed (M~(+2)) and complexed (ML~+) metals. The mechanism for the origin of foreign elements in the bulk of magnetic alloys is discussed.
机译:软磁性NiFe,CoNiFe和CoNiFeO合金的SIMS分析用于量化以下杂质的存在:O,H,C,N,S,Cl和B。XPS分析用于获得化学状态信息。发现合金中杂质元素的含量取决于电镀液中电解质的浓度和存在的有机添加剂。在pH范围为2-6的CoNiFe电镀液中存在的平衡物质的计算表明,可能存在的电活性物质为非复合金属(M〜(+2))和复合金属(ML〜+)。讨论了大多数磁性合金中异质元素起源的机理。

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