Effect of Electrodeposited Thin Film Containing Yttrium on High Temperature Oxidation Behaviour of Ni Base Alloy

摘要

Thin films containing yttrium were deposited on Ni-20Cr substrate surfaces by an aqueous electrochemical technique, called cathodic precipitation. After deposition, the samples were thermally treated to transform the deposited hydroxide into corresponding oxide and to improve the adhesion of the film to the metallic substrate. The influence of these thin solid films on the isothermal oxidation behaviour of a Ni-20%Cr-1.5%Si (wt%) alloy was investigated between 800℃ and 950℃ using several analytical techniques. The influence of silicon is also discussed.