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Nano-Oxidation of Cu(100) Investigated by In situ UHV-TEM

机译:原位UHV-TEM研究Cu(100)的纳米氧化

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The initial stages of the oxide formation were investigated by oxidizing Cu(100) thin films in a specialized in situ ultra-high vacuum (UHV) TEM at oxygen partial pressure of 5x10~(-4) torr and a temperature range of 150℃ to 1000℃. Epitaxial Cu_2O islands formed on Cu(100) where the morphology can be either triangular, huts, rods or pyramids depending only on the oxidation temperature. Of particular focus was the formation of nanorods at 600℃, that was observed to change from initially square shaped islands to elongated islands at a critical size of 114 nm. The experimental data on the elongation of Cu_2O islands agree with the energetic calculations based on the balance between surface/interface energies and the elastic strain relief in the three dimensional islands.
机译:通过在专门的原位超高真空(UHV)TEM中以5x10〜(-4)torr的氧分压和150°C至150°C的温度范围内氧化Cu(100)薄膜来研究氧化物形成的初始阶段。 1000℃。在Cu(100)上形成的外延Cu_2O岛,其形态可以是三角形,小屋,棒状或金字塔形,这仅取决于氧化温度。特别关注的是在600℃下形成纳米棒,观察到纳米棒从最初的方形岛变成了114 nm临界尺寸的细长岛。 Cu_2O岛的伸长率实验数据与基于三维岛中表面/界面能和弹性应变释放的平衡的能量计算结果吻合。

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