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INVESTIGATION OF PLASMA NITRIDED AlZnMgCu 1.5 ALLOY

机译:等离子渗氮AlZnMgCu 1.5合金的研究

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摘要

Aluminium alloy (AlZnMgCu 1.5) was nitrided in a modified plasma nitriding unit. Applying suitable experimental conditions, a thin layer of shiny black aluminium nitride (A1N) with hexagonal crystal structure as well as high hardness was formed on the surfaces of the substrates. Due to the volume expansion of A1N layer during nitriding as well as the difference of the thermal expansion coefficients between the A1N layer and the aluminium substrate, distortions and micro-cracks in the A1N layers occurred, which could be observed metallographically. Therefore, the thickness of well adhesive A1N layers formed on the AlZnMgCu 1.5 substrate must be confined below about three micrometers by a proper adjustment of the nitriding parameters.
机译:铝合金(AlZnMgCu 1.5)在改良的等离子渗氮装置中渗氮。在适当的实验条件下,在基板表面上形成了具有六方晶体结构和高硬度的发光黑色氮化铝(AlN)薄层。由于氮化过程中AlN层的体积膨胀以及AlN层与铝基板之间的热膨胀系数的差异,AlNN层中发生变形和微裂纹,这可以通过金相观察到。因此,必须通过适当调节氮化参数将在AlZnMgCu 1.5衬底上形成的良好粘合剂AlN层的厚度限制在约3微米以下。

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