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UV Generated Photocurrent from MPCVD Grown Diamond- Like Carbon Film

机译:由MPCVD生长的类金刚石碳膜产生的紫外线光电流

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An UV detector is constructed out of 179 nm thick Diamond-Like Carbon (DLC) thin film grown on Si substrate in a MPCVD chamber from mixtures of CH_4,, H_2 and Ar in 1:10:94 seem ratio at 30 Torr . The substrate temperature is 600 ℃ and the growth time is 8 hours. Aluminum electrodes 100 nm thick are evaporated on to the DLC film at 30-60 urn spacing, and shined with a 10 W Philips UV fluorescence light at 300 urn distance. A Kethley 237 is used to measure the UV generated photoelectron current. We found significant UV response from DLC film, which increase with gap distance and bias. The frequency response of DLC may be tunable by adjusting the ratio between sp~2 and sp~3 ratio.
机译:UV检测器由在MPCVD室中在Si基板上生长的179 nm厚的类金刚石碳(DLC)薄膜由CH_4,H_2和Ar的混合物(在30 Torr下以1:10:94 sc比率)构成。基板温度为600℃,生长时间为8小时。将100 nm厚的铝电极以30-60微米的间距蒸发到DLC膜上,并以300微米的距离用10 W飞利浦UV荧光灯照射。 Kethley 237用于测量紫外线产生的光电子电流。我们发现DLC薄膜具有明显的紫外线响应,并随间隙距离和偏压的增加而增加。 DLC的频率响应可以通过调整sp〜2与sp〜3之比来调整。

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