Micro-porous TiO_2 thin films grown on surface of Ti substrate

摘要

Microporous titanium dioxide thin films have been grown on titanium plates by the micro-plasma oxidation method with different current densities (4, 6, 10 and 14 A/dm~2). X-ray diffraction, scanning electronic microscopy and UV-Vis spectrophotometry were used to characterize the films. It is found that the films grown are micro-porous and consist of crystalline titanium dioxide. The micropore size and the content of anatase and rutile TiO_2 phase increase with the applied voltage. The relatively higher degradation efficiency for rhodamine B is obtained in the film produced with a current density of 10 A/dm~2.