Formation of surfactant-silica mesophase films at a silica interface

摘要

Neutron reflectometry has been used to study the development of mesoporous silicated films at a hydrophilic silicon-solution interface. We find the time for film formation was altered in a manner similar to that seen at the air-liquid interface as the silica source-to-surfactant ratio was altered. Interestingly for films grown at the silica-liquid interface in a cell with no air space only one growth mechanism is observed, that of the solution assembly of small particles which then pack at the interface to form the film. We see no evidence of any growth mechanism mediated by interfacial processes.