首页> 外文会议>International Conference on Residual Stresses(ICRS-6) v.1; 20000710-20000712; Oxford; GB >EFFECTS OF PLASMA CLEANING OF A CARBON STEEL SUBSTRATE STUDIED BY PSEUDO-GRAZING INCIDENCE X-RAY DIFFRACTION
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EFFECTS OF PLASMA CLEANING OF A CARBON STEEL SUBSTRATE STUDIED BY PSEUDO-GRAZING INCIDENCE X-RAY DIFFRACTION

机译:伪光栅入射X射线衍射研究碳钢基质的等离子体清洁效应

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Plasma cleaning has been used as a pre-treatment prior to PVD coating processes in order to improve the film adhesion. The biased surface of 20M5 steel substrate exposed to the plasma is subjected to sputtering. The variation of the cleaning parameters, such as, the bias power, the chamber pressure and the process time, modifies the energy of the argon ion bombardment. The aim of this work is to show how the residual stress profile in the near surface of substrate is affected by cleaning parameters. The residual stress profiles in the cleaning 20M5 steel substrates were determined by XRD with Cu kα and Cr kα radiation using the conventional sin~2ψ method and the pseudo-grazing incidence method. The pseudo-grazing incidence method enables the evaluation of the residual stresses for different penetration of the X-rays, thus a profile of residual stress can be obtained. The conversion of the τ-profiles (stress vs. penetration depth, τ) to z-profiles (stress vs. depth curves z) has been extensively treated by several authors. This conversion is delicate and often unstable. It is out of the present work. Concerning the experimental results, residual stress value of the order of -190 MPa was observed at 5.8 μm mean depth in the polished 20M5 steel substrate. After cleaning, the data had shown a decrease to values comprised between -60 MPa and -100 MPa depending on cleaning parameters. The results obtained with Cu kα wavelength shown a residual stress value of the order of -500 MPa at 1.54 μm that relax to -200 MPa after cleaning. In the extreme surface (≈0.1-0.5μm), it seems that the residual stresses state is dependent on the pressure chamber, if a convenient bias power is applied. It is very clear from the profiles that the compressive residual stress value found in the substrate before cleaning due to the mechanical polishing was relaxed after cleaning. However the study had shown that thermal effects seems to be important on the residual stress relaxation over a higher depth range.
机译:等离子清洗已被用作PVD涂层工艺之前的预处理,以提高膜的附着力。暴露于等离子体的20M5钢基材的偏压表面经过溅射处理。清洁参数的变化,例如偏压功率,腔室压力和处理时间,会改变氩离子轰击的能量。这项工作的目的是显示清洁参数如何影响基底附近表面的残余应力分布。采用常规sin〜2ψ法和拟掠入射法,利用Cukα和Crkα辐射,通过X射线衍射确定了清洁的20M5钢基底的残余应力分布。伪掠入射法使得能够针对X射线的不同穿透来评估残余应力,因此可以获得残余应力的轮廓。几位作者已广泛讨论了将τ轮廓(应力与穿透深度,τ)转换为z轮廓(应力与深度曲线z)的方法。这种转换是微妙的,并且通常是不稳定的。这是目前的工作。关于实验结果,在抛光的20M5钢基材中,在平均深度为5.8μm处观察到约-190 MPa的残余应力值。清洁后,数据显示取决于清洁参数,其值降低到-60 MPa至-100 MPa之间。用Cukα波长获得的结果显示,残余应力值在1.54μm时约为-500 MPa,清洗后松弛到-200 MPa。在极端表面(≈0.1-0.5μm)中,如果施加方便的偏置功率,似乎残余应力状态取决于压力腔。从轮廓上非常清楚的是,由于机械抛光,在清洗之前在基板中发现的压缩残余应力值在清洗之后被放宽了。然而,研究表明,热效应对较高深度范围内的残余应力松弛似乎很重要。

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