Increase Semiconductor Equipment Productivity by a Process Monitor

摘要

In situ process gas monitoring adds value to semiconductor manufacturing by detecting abnormalities in the process before multiple wafers are affected. In addition, process gas monitors shorten and improve the PM cycle, provide characterization data for the tool and process, and save wafers and tune during process development. Integration of process gas monitors with the tool host computer and the advent of a time-based reference process software technique greatly enhance the process monitor capability for multi-step processes.