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III-Nitride advanced technologies and equipment for microelectronics

机译:III-氮化物微电子学的先进技术和设备

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摘要

Using of complex equipment SemiTEq shown in example of a closed cycle of basic technological operations for production of high-power field microwave transistors based on gallium nitride in the "Svetlana-Rost" JSC. Basic technological operations are shown: MBE growth of heterostructures, metal deposition of contacts using electron-beam evaporation system, thermal annealing of ohmic contacts, meza-isolation plasma-chemical etching and dielectric plasma deposition. The main problems during the technological route as well as ways to solve are discussed. In particular, ways to reduce the dislocation density in the active region of the transistor heterostructures grown on the mismatched substrates are described in detail. Special attention given to the homogeneity and reproducibility both after some manufacturing operations and applied to the end product.
机译:使用复杂的设备SemiTEq在“ Svetlana-Rost” JSC中用于生产基于氮化镓的高功率场微波晶体管的基本技术操作的封闭循环示例中显示。显示了基本的技术操作:异质结构的MBE生长,使用电子束蒸发系统的触点金属沉积,欧姆触点的热退火,Meza隔离等离子体化学蚀刻和介电等离子体沉积。讨论了技术路线中的主要问题以及解决方法。特别地,详细描述了减小在不匹配的衬底上生长的晶体管异质结构的有源区中的位错密度的方法。在进行某些制造操作后并应用于最终产品时,均应特别注意均质性和可重复性。

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