Projection photolithography modeling using the finite-difference time- domain approach

摘要

The photolithographic finite-difference time-domain (PFDTD) approach to the modeling of 3D electromagnetic fields and photolithographic structures for projection photolithography in sub-0.2μm and nanometer ranges is developed. It is based on adaptation and application of advanced methods of the Maxwell equations' solution to photolithography problems. The appropriate computational methods and modeling algorithms are created and applied to specific problems. It is shown that sometimes the PFDTD-approach could be preferred over the routine the rigorous coupled-waves analysis (RCWA), especially for the relatively small critical dimensions and in short wavelength range. It allowed us to extent the application domain of our own photolithography software package, and to improve quality and accuracy of topical projection schemes' simulation.