Surface nano- and micro-structuring by means of an automated laser pattern generator

摘要

To replace the expensive means of generating prototypes of lithography masks for microstructuring, by using an e-beam writing process, alternative methods have been applied to construct two different devices. In one alternative a laser pattern generator (LPG), uses a focussed laser beam to directly write the microstrucure into the photo resist layer. The other alternative is the process of scanning nearfield optical lithography (SNOL), that uses a fibre tip to generate structures smaller than 100 nm. Both systems have been tested and improved.