LASING PROCESSES IN GASEOUS ACTIVE MEDIA-NUMERICS IN CHEMICAL LASERS

摘要

The farther evaluations of the working parameters in gaseous mixture for lasing process are computed by algorythms developed for the HF, DF, and similar systems. The program is developed for different vibrational-rotational transitions. The lasing gain profiles and its dependence on input parameters will be carefully considered. The parametric study examines the effects induced by changing mixture ratios and cavity parameters. The detailed population of the different vibrational, rotational and electron states for defined active material, has to be evaluated. The next topic in the analysis of chemical lasers are the methods of obtaining the proper conditions for the efficient pumping. These results could be helpful for the practical realisations of the chemical lasers with active material in flow geometry. Already developed algorithms for this purpose will be tested according to the data in literature.