首页> 外文会议>International Conference on Integration and Commercialization of Micro and Nanosystems; 20070110-13; Sanya(CN) >The UTAM Nano-pattterning: A New Surface Nano-patterning Technique In Fabricating Ordered Arrayed Surface Nanostructures
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The UTAM Nano-pattterning: A New Surface Nano-patterning Technique In Fabricating Ordered Arrayed Surface Nanostructures

机译:UTAM纳米图案化:制造有序阵列表面纳米结构的新表面纳米图案化技术

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摘要

A new surface nano-patterning technique, the so-called UTAM nano-patterning approach, is reported here in this paper. Using the UTAM nano-patterning technique, large-scale arrays of highly ordered nanostructures (nanoparticles and nanoholes) in the range of square centimeters have been fabricated on substrates in a massive parallel way. The resulting nanostructures are characterized by highly defined and controllable size, shape, composition, and spacing of the nanostructures. By changing the structural parameters of the nanoparticles, the properties of the nanoparticle arrays can be tuned. This non-lithographic surface nano-patterning approach provides an efficient and low-cost alternative in fabricating large-scale ordered arrays of surface nanostructures.
机译:本文在此报道了一种新的表面纳米图案化技术,即所谓的UTAM纳米图案化方法。使用UTAM纳米图案技术,已经在基板上大规模平行地制造了在平方厘米范围内的大范围排列的高度有序的纳米结构(纳米粒子和纳米孔)阵列。所得的纳米结构的特征在于纳米结构的高度限定且可控制的尺寸,形状,组成和间距。通过改变纳米颗粒的结构参数,可以调节纳米颗粒阵列的性能。这种非光刻的表面纳米图案化方法为制造表面纳米结构的大规模有序阵列提供了一种有效且低成本的选择。

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