Image Science Technology Forecasting on offset printing: A Patent Analysis Approach

摘要

Technology forecasting is a important approach which can help researcher to point out what will be of technology in the future. There are many well-developed approaches and methodologies can do technology forecasting well, for example S-curve analysis. Patent analysis is another way to analyze technology development trend. Patent is a kind of intellectual property right can help researcher avoid to infringe patent owned by competitor. Patent analysis can help researcher and corporate find out what are major technology trends and point out what field has low patent infringement risk. It will describe what patent analysis is briefly and how to process, and use patent analysis to analysis image reproduction technology trend. Offset printing technology is the main field discussed. When running analysis will follow the international patent classification (IPC) category and use USPTO patent database.