STUDY ON THE MULTI-DOF MEASUREMENT SYSTEM OF PRECISION POSITIONING STAGE

摘要

The manufacturing accuracy of integrated chip (IC) in photolithography is mainly determined by the motion precision of the positioning stage. In this paper firstly we briefly introduce the motion character of the precision positioning stage of photolithography, then we describe the function requirement of the multi-DOF motion measurement system in the precision positioning stage, finally through analyzing and comparing the measurement methods of the precision positioning stage at home and abroad currently, we point out the development trend of the motion measurement system of the precision positioning stage. Based on above results a multi-DOF measurement method based on machine vision and plane normal grating is proposed, the measuring principle of this method is described, and the measuring accuracy of it is analyzed.