High temeprature superconductor thin films: deposition techniques and in situ characterizations

摘要

The methods for depositing thin films using vacuum processes are generally divided in two main classes: Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD), such as sputtering, laser ablation, evaporation, molecular beam epitaxy (MBE). This article will focus on PVD techniques used to prepare High Temperature Superconducting (HTS) thin films, illustrating the main characteristics of sputtering, thermal and electron beam evaporation, and in particular of MBE. Moreover, we will only deal with some representative and typical results, aiming at an illustration of the most often encountered problems and solutions.